G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/075 (2006.01) G03F 7/16 (2006.01) G03F 7/36 (2006.01)
Patent
CA 2135413
A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phaseand show excellent promise for use such as resists in the fabrication of electronic and optical devices.
Joshi Ajey Madhav
Weidman Timothy William
At&t Corp.
Kirby Eades Gale Baker
LandOfFree
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