G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/075 (2006.01) G03F 7/16 (2006.01) G03F 7/36 (2006.01)
Patent
CA 2085698
A class of silicon-containing materials display excellent sensitivity in the ultraviolet and deep ultraviolet for the formation of patterns by radiation induced conversion into glassy compounds. Materials are depositable from the vapor phaseand show excellent promise for use such as resists in the fabrication of electronic and optical devices.
Joshi Ajey Madhav
Weidman Timothy William
American Telephone And Telegraph Company
Joshi Ajey Madhav
Kirby Eades Gale Baker
Weidman Timothy William
LandOfFree
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