Enhancement of resist development

Details Enhancement of resist development Enhancement of resist development

G - Physics

03

G

96/269, 96/63

G03G 9/16 (2006.01) G03F 7/022 (2006.01)

Patent

CA 1120763

ENHANCEMENT OF RESIST DEVELOPMENT Abstract of the Disclosure The present invention is concerned with enhancement of resist development. In particular it is concerned with obtaining high solubility rate ratio between the exposed and the unexposed regions of a resist and also obtaining shorter development time. These objectives are achieved by treating the resist with a liquid trialkylamine having from two to eight carbon atoms in each alkyl group.

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