Enhancing epitaxy and preferred orientation

Details Enhancing epitaxy and preferred orientation Enhancing epitaxy and preferred orientation

C - Chemistry, Metallurgy

30

B

148/1

C30B 25/04 (2006.01)

Patent

CA 1102223

ABSTRACT OF THE DISCLOSURE An array of oriented artificial relief features or artificial point defects embraced by parallel planes on a substrate surface influence the orientation of solid films during the course of their growth on the substrate surface. There may be multiple sets embraced in generally parallel planes at an angle to each other that is an integral multiple of 30°. Although there are many impor- tant technological opportunities for the application of preferred orientation and epitaxial films, particularly in electronic, acoustic and optical devices, with a few notable exceptions, such films have not been consistently obtained with sufficient quality or in a sufficient number of combinations and orientations to meet the requirements.

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