Epihalohydrin-based resins having a reduced halogen content

C - Chemistry – Metallurgy – 08 – G

Patent

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C08G 59/00 (2006.01) C08G 69/48 (2006.01) C08G 73/02 (2006.01) D21H 17/52 (2006.01) D21H 17/55 (2006.01) D21H 17/56 (2006.01) D21H 21/20 (2006.01)

Patent

CA 2111685

The disclosed invention pertains to a process for the preparation of a water- soluble, nitrogen-containing, epihalohydrin- based resin having a reduced content of total halogen, organic halogen, adsorbable organic halogen (AOX) and by-products. The process involves treatment of nitrogen-containing, epihalohydrin-based resins or intermediate reaction-products with a basic ion- exchanger. The invention also pertains to novel resins displaying such halogen contents far below the values known in the art. Subject resins are useful as wet-strength agents for paper and are preferably of the polyaminoamide-epihalohydrin type.

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