Epitaxial growing method for growing aluminum nitride and...

C - Chemistry – Metallurgy – 30 – B

Patent

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Details

C30B 23/00 (2006.01) C30B 23/02 (2006.01) C30B 25/08 (2006.01) C30B 29/38 (2006.01)

Patent

CA 2383400

The invention relates to an epitaxial growing method for growing monocrystalline aluminum nitride from a mixture of nitrogen and aluminum vapors, said method comprising the following steps: a substrate (4) and a source of aluminum (5) are placed opposite to each other inside a growing chamber (3); said substrate is heated to a temperature ensuring the growth of monocrystalline aluminum nitride, whereby said temperature is maintained. Inside the growing chamber (3), the pressure of the mixture of nitrogen and aluminum vapors is maintained, whereby said pressure exceeds, by no more than 400 millibars, a lower threshold equal to the pressure generated within a closed space by a stoichiometric mixture of nitrogen and aluminum vapors formed by evaporation of the source material (5). The invention also relates to a growing chamber (3), whereby the material in contact with the source and the aluminum vapors of the surface inside said chamber is a solid solution of tantalum carbide in carbide.

L'invention concerne un procédé de croissance épitaxiale de nitrure d'aluminium monocristallin à partir d'un mélange d'azote et de vapeurs d'aluminium, qui consiste à placer l'un face à l'autre dans une chambre de croissance (3) un substrat (4) et une source (5) d'aluminium, à chauffer le substrat (4) et la source (5) à une température assurant la croissance du nitrure d'aluminium monocristallin et à entretenir cette température. On entretient dans la chambre de croissance (3) une pression du mélange d'azote et des vapeurs d'aluminium dans un intervalle ne dépassant pas de 400 millibars une valeur plancher égale à la pression générée dans un espace clos par un mélange stoechiométrique d'azote et de vapeurs d'aluminium formées par l'évaporation du matériau de la source (5). L'invention concerne une chambre de croissance (3) dans laquelle le matériau en contact avec la source et les vapeurs d'aluminium de la surface se présente comme une solution solide de carbure de tantale dans du tantale.

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