Equipment and method for physical vapor deposition

Details Equipment and method for physical vapor deposition Equipment and method for physical vapor deposition

C - Chemistry, Metallurgy

23

C

C23C 14/00 (2006.01) C23C 14/24 (2006.01)

Patent

CA 2731408

A physical vapor deposition apparatus for coating a substrate that includes a substrate holder that receives the substrate and a coating material source that emits a divergent stream of coating material. The divergent stream of coating material includes a diverse portion of coating material and a directed portion of coating material. The apparatus further includes a blinder means, positioned to be in operative engagement with the coating material source, for receiving and impacting the divergent stream of coating material so that the directed portion of coating material continuously exits the blinder means traveling generally toward the substrate holder. The directed portion of coating material exhibits less divergence than the divergent stream of coating material.

L'invention concerne un appareil de dépôt physique en phase vapeur pour enrober un substrat qui inclut un support de substrat qui reçoit le substrat et une source de matière d'enrobage qui émet un flux divergent de matière d'enrobage. Le flux divergent de matière d'enrobage inclut une partie dispersée de matière d'enrobage et une partie dirigée de matière d'enrobage. L'appareil inclut en outre un moyen de cache, positionné pour être en engagement opérationnel avec la source de matière d'enrobage, destiné à recevoir et à entrer en collision avec le flux divergent de matière d'enrobage de sorte que la partie dirigée de matière d'enrobage sorte en continu du moyen de cache se déplaçant généralement en direction du support de substrat. La partie dirigée de matière d'enrobage présente une divergence moindre que le flux divergent de matière d'enrobage.

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