C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 17/08 (2006.01)
Patent
CA 2117883
The invention relates to novel compounds having the general formula (I): Image wherein R1 is a hydrogen atom or an acyl group; R2 and R3 are the same or different and each represents a hydrogen atom, a hydroxyl group, an acyloxy group or an amino group, or, in combination, they represent =0 or =NOR10. where R10 represents a hydrogen atom or a lower alkyl group; R4 represents a hydrogen atom or a lower alkyl group; and Y represents NR5R6 or -N+R7R8R9X-, where R5, R6, R7 R8 and R9 are the same or different and each represents a hydrogen atom or an unsubstituted or substituted lower alkyl group, lower alkenyl group, lower alkynyl group, cycloalkyl group or 3-7-membered heterocyclic group comprising an oxygen atom, nitrogen atom or sulphur atom as an heteroatom, together with the neighboring nitrogen atom or R5 and R6, or R7 and R8 form an azacycloalkyl group and salts thereof. The compounds of the invention have a remarkably lower degree of decomposition by gastric acid than known erythromycin derivatives, and have an excellent enterolinesis stimulating action.
Koga Hiroshi
Sato Tsutomu
Takanashi Hisanori
Chugai Seiyaku Kabushiki Kaisha
Norton Rose Or S.e.n.c.r.l. S.r.l./llp
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