C - Chemistry – Metallurgy – 07 – H
Patent
C - Chemistry, Metallurgy
07
H
C07H 15/26 (2006.01) A61K 31/70 (2006.01) C07H 17/075 (2006.01)
Patent
CA 2135850
A compound of the formula (I): (see. formula I) wherein R1 and R2 are, independently, a hydrogen atom, a monosaccharide residue, a protected monosaccharide residue, or a protecting group for hydroxyl group, but at least one of R1 and R2 is a monosaccharide residue or a protected monosaccharide residue, and R3 is a hydrogen atom, a hydroxyl group, an alkyl group, an aryl group, or an aralkyl group, with the proviso that (1) when R1 and R2 are glucose residues at the same time, R3 is not a hydrogen atom, (2) when R1 is a hydrogen atom, an acetyl group or a benzyl group and R2 is a glucose residue, an acetylated glucose residue, or acetalized glucose residue, R3 is not a hydrogen atom, or (3) when R1 is a glucose residue and R2 is a hydrogen atom, R3 is not a hydrogen atom or a salt thereof is disclosed.
Miyagawa Junko
Niimura Koichi
Watanabe Koju
Kureha Corporation
Mcfadden Fincham
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