C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/279.2
C07D 495/04 (2006.01)
Patent
CA 1061345
Abstract of the Disclosure Novel thienobenzopyran and thiopyranobenzopyran esters represented by the formla Image wherein n is 0 to 3 and m is 0 to 3 and m + n = 2 or 3, R1 is lower alkyl, R2 is alkyl or cycloalkyl-lower alkyl, hydrogen is hydrogen or lower alkyl, R5 is hydrogen or lower alkyl, and R3 is Image wherein Y is a straight pr branched chain C1 to C8 alkylene, R6 is hydrogen or a lower alkyl, a is an interger from 1 to 4, b is an interger from 1 to 4, X CH2, O, S or WR7 wherein R7 is hydrogen or lower alkyl, with the limitation that when X is O, S or NR7, a and b each must be 2; and the acid addition salts thereof. The novel compounds are useful as one or more of ant-depressant, anti- anxiety, analgesic and anticonvulsant agents.
224783
Harris Louis S.
Pars Harry G.
Razdan Raj K.
Sheehan John C.
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