C - Chemistry – Metallurgy – 25 – F
Patent
C - Chemistry, Metallurgy
25
F
204/20, 204/11.5
C25F 3/04 (2006.01) B41N 3/03 (2006.01) C23F 1/20 (2006.01) C25D 11/04 (2006.01)
Patent
CA 1235380
Abstract of the Disclosure A method for treating an aluminum sheet useful for lithography by etching said sheet in an aqueous bath containing up to about 25% of nitric and/or hydrochloric acids and from about 1% to about 25% of an inorganic fluorine containing acid or salt thereof. Said etching step is sequentially followed by electrochemical gaining and anodizing process steps.
482400
Fetherstonhaugh & Co.
Hoechst Celanese Corporation
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