Etching method using noble gas halides

Details Etching method using noble gas halides Etching method using noble gas halides

C - Chemistry, Metallurgy

23

F

149/5

C23F 1/00 (2006.01) C01B 23/00 (2006.01) H01L 21/306 (2006.01) H01L 21/3065 (2006.01) H01L 21/3213 (2006.01)

Patent

CA 1108513

ABSTRACT A method for etching using a noble gas halide.

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