Etching process with vibrationally excited sf.sub.6

Details Etching process with vibrationally excited sf.sub.6 Etching process with vibrationally excited sf.sub.6

H - Electricity

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H01L 21/306 (2006.01) C23F 1/12 (2006.01) H01L 21/3065 (2006.01) H01L 21/3213 (2006.01)

Patent

CA 1153674

SA9 80 049 ETCHING PROCESS WITH VIBRATIONALLY EXCITED SF6 Abstract of the Invention A substrate which forms a volatile fluoride is etched and directionality is achieved using vibrationally ex- cited SF6 which has been exposed to laser irradiation. The substrate is etched through a mask having openings smaller than the diffraction limit of the laser light.

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