Etching solution for etching of photopolymeric films

Details Etching solution for etching of photopolymeric films Etching solution for etching of photopolymeric films

C - Chemistry, Metallurgy

09

D

149/27

C09D 9/00 (2006.01) G03F 5/00 (2006.01) G03F 7/40 (2006.01)

Patent

CA 1195595

TITLE ETCHING SOLUTION FOR ETCHING OF PHOTOPOLYMERIC FILMS ABSTRACT OF THE INVENTION Etching solution for dot etching photopolymerized materials which comprises an organic polymeric binder having alkali soluble groups, monomer and photoinitiator, the material having an optical density in the actinic region of at least 1.0, wherein a water-soluble salt of a water-insoluble polymeric polycarboxylic acid whose acid strength is the same or less than that of the binder is present as the etching agent.

417958

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