C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 220/34 (2006.01) C08F 210/02 (2006.01)
Patent
CA 2047458
A copolymer is manufactured by allowing ethylene (A) and a vinyl compound (B) represented by the following general formula to undergo radical polymerization at a pressure of 1000-5000 kg/cm2 and a temperature of 100°-400°C, (see formula I) wherein R1 and R2 are each, independently hydrogen or a methyl group, R3 is a hydrogen atom or an alkyl group of 1-4 carbon atoms; a ratio of (B) to the sum of (A) and (B) is less than 1 mol %; a proportion of the amount of vinyl compounds (B), which are not successively bonded at all to the units (B) in the chain, but bonded to unlike units (A) on both sides thereof, to the total amount of (B) units in the copolymer is at least a 83%; and the MFR of the copolymer ranges from 0.1 to 200g/10 min. Although the copolymer contains only a small amount of the vinyl compound (B) it nevertheless has excellent photo stabilizing effects.
Higaki Yoshikazu
Ikeno Hajime
Matsubara Koshi
Nakamura Kenichi
Okada Tadao
Marks & Clerk
Mitsubishi Chemical Corporation
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