C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 63/54 (2006.01)
Patent
CA 2052617
An ethylene polymer which is capable of being degraded by microorganisms is provided which comprises a recurring unit represented by the general formula or (see fig. I) or (see fig. II) in which R is a divalent hydrocarbon group containing 2 to 20 carbon atoms, R' is a divalent hydocarbon group containing 1 to 20 carbon atoms and A is a polyethylene segment comprising a recurring unit represented by the formula -( - CH2- CH2 - )- and having a number average molecular weight (Mn) of 300 to 300,000. and the ethylene polymer having a number average molecular weight (Mn) of 500 to 5.000,000.
Polymère éthylénique pouvant être dégradé par des microorganismes, lequel renferme une unité récurrente, représentée par la formule générale (I) ¢voir fig. I! ou (II) ¢voir fig. II!, où R est un groupe hydrocarboné divalent contenant 2 à 20 atomes de carbone, R' est un groupe hydrocarboné divalent renfermant 1 à 20 atomes de carbone, et A est un segment de polyéthylène possédant une unité récurrente, représentée par la formule -(-CH2-CH2)- et ayant une masse moléculaire moyenne de 300 à 300 000; le polymère éthylénique possède une masse moléculaire moyenne de 500 à 5 000 000.
Furuhashi Hiroyuki
Koyama Naomi
Mikawa Naohiro
Morioka Tetsuya
Toki Shigeyuki
Riches Mckenzie & Herbert Llp
Tonen Corporation
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