Ethylene polymer films of reduced haze

C - Chemistry – Metallurgy – 08 – K

Patent

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Details

18/789, 400/9453

C08K 5/20 (2006.01) B29C 33/60 (2006.01) C08J 5/18 (2006.01) C08K 13/02 (2006.01) C08L 23/04 (2006.01)

Patent

CA 1064639

ABSTRACT OF THE DISCLOSURE A composition for preparing a self-supporting film of reduced haze. The composition comprises a film grade ethylene- polymer; 0.01-0.5 weight percent of N,N'-ethylene bis, erucamide providing a blocking value of at least 70 and a coefficient of friction not greater than 23; 0.01-0.5 weight percent of slip agent which is different than said bis erucamide; and 0.01-0.5 weight percent anti-block agent which is different than said bis erucamide and slip agent; the percentages being based on the weight of the ethylene polymer. The improved film is a result of the substitution of the bis erucamide for a portion of the anti-block agent.

239437

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