H - Electricity – 01 – S
Patent
H - Electricity
01
S
H01S 3/10 (2006.01) H01S 3/08 (2006.01) H01S 3/0975 (2006.01) H01S 3/225 (2006.01)
Patent
CA 2210830
This invention relates to an excimer laser oscillation apparatus which has a laser chamber which stores a laser gas containing a gas mixture of at least one inert gas selected from the group consisting of Kr, Ar, and Ne, and F2 gas, and in which an inner surface thereof has a reflection-free surface with respect to light of a desired wavelength of 248 nm, 193 nm, or 157 nm, and the uppermost surface of the inner surface consists of a fluoride, an optical resonator which is made up of a pair of reflection mirrors arranged to sandwich the laser chamber therebetween, and in which the reflectance of the reflection mirror on the output side is 90% or more and microwave introduction means, arranged on the laser chamber, for continuously exciting the laser gas in the laser chamber.
L'invention est un laser à excimère. Ce laser comporte une chambre qui contient un mélange de F2 et d'au moins un gaz inerte choisi parmi le groupe constitué de Kr, Ar et Ne, et dont la face interne absorbe intégralement la lumière aux longueurs d'ondes de 248 nm, 193 nm et 157 nm, la partie supérieure extrême de cette surface interne étant constituée d'un fluorure. Le laser de l'invention comporte également un résonateur optique constitué d'une paire de miroirs entre lesquels la chambre se trouve en sandwich, la réflectance de ces miroirs étant de 90 % au moins. Le laser comprend de plus un dispositif d'introduction de micro-ondes dans la chambre pour exciter de façon continue le gaz qui s'y trouve.
Hirayama Masaki
Ohmi Tadahiro
Tanaka Nobuyoshi
Canon Kabushiki Kaisha
Ohmi Tadahiro
Ridout & Maybee Llp
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