Exposure control process and photographic copying apparatus

Details Exposure control process and photographic copying apparatus Exposure control process and photographic copying apparatus

H - Electricity

04

N

H04N 1/32 (2006.01) G03B 27/72 (2006.01) G03B 27/73 (2006.01) H04N 1/04 (2006.01) H04N 1/21 (2006.01) H04N 1/46 (2006.01)

Patent

CA 2049250

9-18201/A/GTP 557 Exposure Control Process and Photographic Copying Apparatus ABSTRACT The copying light of a source of copying light is attenuated in areas using a mask with different density ranges to influence the density by areas of a copy to be produced from a copy master. The appropriate area of the mask is selected by analyzing a location dependent density variation of the mask stored in matrix form in a computing andevaluating unit by predetermined criteria. A photographic copying apparatus associated with the process includes an exposure station with a mask mounted on a slide. The slide may be displaced in response to control signals determined and generated in the computing and evaluating unit. The slide is displaced in a plane parallel to a transport plane of the copy master in the beam path of a source of copying light.

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