Exposure control system for full field photolithography...

Details Exposure control system for full field photolithography... Exposure control system for full field photolithography...

G - Physics

03

F

95/25, 341/31

G03F 7/20 (2006.01)

Patent

CA 1300717

MI-3741 ABSTRACT OF THE DISCLOSURE EXPOSURE CONTROL SYSTEM FOR FULL FIELD PHOTOLITHOGRAPHY USING PULSED SOURCES A photolithography exposure control system tolerant of noisy pulsed light sources having a controllable variable attenuator. A detector monitors the exposure dose of a light pulse enabling a controller to trigger another light pulse, when a predetermined attenuator is positioned in its path. A high degree of exposure control is achieved with a minimum number of light pulses or shots.

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