Exposure control system with follow focus capability

Details Exposure control system with follow focus capability Exposure control system with follow focus capability

G - Physics

03

B

95/43, 95/62, 95

G03B 7/16 (2006.01)

Patent

CA 1064751

ABSTRACT OF THE DISCLOSURE An improved exposure control system featuring a follow-focus mechanism wherein the geometrical relation- ship of the mechanical components are determined in a select manner to provide uniform adjustment of the exposure aperture through a trim mechanism irrespective of the actual focus setting. The follow focus additionally may be precisely calibrated despite the cumulative effect attributable to the dimensional variations of the individual components albeit such variations remain within prescribed tolerances.

246823

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