Exposure control system with inertial characteristic

Details Exposure control system with inertial characteristic Exposure control system with inertial characteristic

G - Physics

03

B

95/82

G03B 9/08 (2006.01) G03B 9/24 (2006.01) G03B 9/40 (2006.01) G03B 9/58 (2006.01)

Patent

CA 1053054

Abstract of the Disclosure An exposure control system for photographic appa- ratus includes inertial means for selectively presenting an inertial characteristic to influence the movement of the exposure control system shutter blade elements. The iner- tial characteristic influences the rate of movement of the shutter blade elements toward their maximum aperture defining position without influencing the return movement of the shutter blade elements toward their closed position. The inertial means is also thereafter automatically reset in readiness for the next photographic cycle.

250185

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