Exposure process

Details Exposure process Exposure process

G - Physics

03

F

356/18, 96/247

G03F 5/02 (2006.01) G03F 7/20 (2006.01) H05K 3/00 (2006.01) H05K 3/28 (2006.01) H05K 3/34 (2006.01)

Patent

CA 2021474

K-17672/= Exposure Process Abstract of the Disclosure The process for the preparation of photostructured layers by exposing a positivephotoresist through a perforated material which is impervious to light saves thetime-consuming and expensive preparation of film patterns for solder varnishes.

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