Fabrication of a microchannel plate from a perforated...

B - Operations – Transporting – 44 – C

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B44C 1/22 (2006.01) C03B 15/00 (2006.01) H01J 9/12 (2006.01) H01L 21/00 (2006.01)

Patent

CA 2229717

Manufacture of a microchannel plate may be improved using photoelectrochemical etching and thin film activation such as CVD and nitriding and oxidizing wall surface portions (28) of pores (12) formed in the substrate (10). The pore pattern may be changed by oxidizing and etching the substrate prior to activation.

La fabrication d'une galette de microcanaux peut être améliorée au moyen de l'attaque photoélectrochimique et de techniques d'activation des films minces, comme la déposition en phase vapeur, la nitruration et l'oxydation de parties de paroi (28) de pores (12) réalisés sur le substrat (10). La configuration des pores peut être modifiée par oxydation et attaque du substrat avant son activation.

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