Fabrication of aluminum-containing semiconductor devices

C - Chemistry – Metallurgy – 30 – B

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C30B 31/20 (2006.01) C30B 25/02 (2006.01) H01L 21/205 (2006.01) H01L 21/331 (2006.01)

Patent

CA 2059408

- 16- FABRICATION OF ALUMINUM-CONTAINING SEMICONDUCTOR DEVICES Abstract Processes for introduction of aluminum during MetalOrganic Molecular Beam Epitaxy are dependent upon specification of source materials for yielding the aluminum. A major obstacle to use of this excellent growth process, particularly as applied to a major class of compound semiconductor devices, is thereby overcome.Expeditious growth of high quality materials within the direct bandgap AlGaAs composition range has broad implications as concerning LSI/VLSI integrated circuits - electronic, photonic, as well as hybrid.

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