Fabrication of diffractive subtractive filter embossing master

Details Fabrication of diffractive subtractive filter embossing master Fabrication of diffractive subtractive filter embossing master

G - Physics

03

C

96/255

G03C 5/00 (2006.01) G03F 7/00 (2006.01)

Patent

CA 1095311

RCA 70,656 FABRICATION OF DIFFRACTIVE SUBTRACTIVE FILTER EMBOSSING MASTER Abstract of the Disclosure A recording blank, composed of at least one dif- fraction grating substrate, such as nickel, covered with a layer of photoresist is used to produce an embossing master by exposing the photoresist to picture information composed of respective white and non-white manifesting regions; developing the exposed photoresist to reveal the grating portions underlying solely the white manifesting regions; electroplating and/or etching the revealed portions to flat- ten and obliterate the revealed grating portions, and then removing the remainder of the photoresist. -1-

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