G - Physics – 03 – F
Patent
G - Physics
03
F
96/256, 204/91.6
G03F 7/038 (2006.01) G03F 7/075 (2006.01)
Patent
CA 1312843
- 18 - FABRICATION OF ELECTRONIC DEVICES UTILIZING LITHOGRAPHIC TECHNIQUES Abstract This invention concerns with a process for fabricating an article, such as an electronic device by the steps of forming a radiation-sensitive region on a substrate, patterning at least a portion of said region and further processing the substrate. The radiation- sensitive region comprises polymers formed from monomers such as chloromethyl styrene and trimethylsilylmethyl methacrylate. Such polymers form negative-acting resists that are sensitive to exposure by electron beam and deep UV radiation. These materials are particularly useful in bilevel resist applications for fabricating masks or for device processing.
531265
Novembre Anthony Edward
Reichmanis Elsa
American Telephone And Telegraph Company
Kirby Eades Gale Baker
LandOfFree
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