Fabrication of polycrystalline free-standing diamond films

Details Fabrication of polycrystalline free-standing diamond films Fabrication of polycrystalline free-standing diamond films

C - Chemistry, Metallurgy

30

B

C30B 25/00 (2006.01) C23C 16/01 (2006.01) C23C 16/27 (2006.01) C30B 25/02 (2006.01) C30B 29/04 (2006.01)

Patent

CA 2050456

-15- Abstract of the Disclosure Method of fabricating free-standing diamond films by depositing and adhering polycrystalline diamond by hot filament chemical vapor deposition (1-100 Torr, filament temperature equal to or greater than 1900°C, substrate temperature of 650-950°C) onto a substrate meltable at a temperature slightly in excess of the deposition temperature; and (b) prior to cooling said polycrystalline diamond particles, increasing (50-300°C) the substrate temperature to melt at least a portion thereof while permitting such melt to emigrate from the diamond films. 5273L

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