G - Physics – 03 – F
Patent
G - Physics
03
F
G03F 7/11 (2006.01) C08B 15/06 (2006.01) C08L 1/10 (2006.01) C08L 1/12 (2006.01) C08L 1/14 (2006.01) C08L 1/26 (2006.01) C09D 101/14 (2006.01) G02B 1/11 (2006.01) G03F 7/09 (2006.01)
Patent
CA 2330689
Anti-reflective compostions are prepared from cellulosic binders and alkylated aminoplast cross-linking agents derived from melamine, urea, benzoguanamine or glycoluril. These compositions are used to form bottom anti-reflective layers with high plasma etch selectivity when used in multilayer photoresist processes.
L'invention concerne des compositions antiréfléchissantes préparées avec des liants cellulosiques et des agents de réticulation aminoplastes alkylés obtenus à partir de la mélamine, de l'urée, de la benzoguanamine ou du glycoluril. Ces compositions sont employées pour former des couches inférieures antiréfléchissantes à grande sélectivité de gravure au plasma, lorsqu'elles entrent dans des processus à photorésine multicouche.
Brewer Terry Lowell
Meador Jim D.
Shao Xie
Brewer Science Inc.
Gowling Lafleur Henderson Llp
LandOfFree
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