Field effect semiconductor device

H - Electricity – 01 – L

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356/128

H01L 29/76 (2006.01)

Patent

CA 1151774

Abstract of the Disclosure A semiconductor device having a first field-effect device provided in and on a first substrate at a first major surface thereof. The first substrate is of a first conductivity type (except in selected regions), due to the pressure of a first dopant. A plurality of such selected regions intersect the first major surface in a first major surface. The field-effect device comprises a first field-effect device channel region which is located at least in part, in the first substrate. A pair of first field-effect device terminating regions each being of a second conductivity type are each located in one of the selected regions intersecting the first major surface portion such that they are separated by the first field-effect device channel region. A pn junction separates each member of the first field-effect device terminating region pair from remaining portions of the first substrate. The first field-effect device terminating region pair has a second dopant distrib- uted in each member leading to the second conductivity type. The device includes a first field-effect device control gate region which is separated from the first major surface portion by a first insulating layer of a first thickness and located across the first insulating layer from the first field- effect device channel region. The device further includes a first field- effect device shield region separated from the first major surface by a second insulating layer of a second thickness and located across the second insulating layer from substantially all of the member pn junctions where these member pn junctions intersect the first major surface.

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