Field effect transistor

Details Field effect transistor Field effect transistor

H - Electricity

01

L

H01L 29/812 (2006.01) H02G 1/02 (2006.01)

Patent

CA 2058465

Abstract of the Disclosure This invention aims at providing an high output FET having a planar type-gate structure suitable for integration, and a structure that suppresses long gate effect. A heavily doped thin channel layer 13 is formed on a semiconductor substrate 11, and a cap layer including a doped layer 15 is formed on the channel layer 13. A thickness and a dopant concentration of the doped layer 15 are so set that the doped layer 15 per se is depleted hy a surface depletion region resulting from an interface level of the semiconductor substrate surface, and the surface depletion region does not widen to the channel layer 13. Consequently no long gate effect takes place on the side where a gate bias is lower.

Affiliated with

Also associated with

Rating

Field effect transistor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Field effect transistor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Field effect transistor will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFCA-PAI-O-1408603