Field effect transistor and method of fabricating

Details Field effect transistor and method of fabricating Field effect transistor and method of fabricating

H - Electricity

01

L

H01L 29/808 (2006.01) H01L 21/335 (2006.01) H01L 29/772 (2006.01)

Patent

CA 2086211

FIELD EFFECT TRANSISTOR AND METHOD OF FABRICATING Abstract A junction field effect transistor, specifically a static induction transistor. The N-type source regions are formed as two zones. First, relatively lightly doped first zones are formed by ion-implanting doping material relatively deeply into the semiconductor material. Then relatively heavily doped second zones are formed by ion-implanting doping material to a relatively shallow depth within the first zones to leave portions of the first zones interposed between the second zones and the remainder of the semiconductor material. The resulting devices exhibit reduced gate-drain junction capacitance at low drain bias voltages thereby improving device capaci- tance linearity.

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