Film-forming composition suitable for use as a monocoat

Details Film-forming composition suitable for use as a monocoat Film-forming composition suitable for use as a monocoat

C - Chemistry, Metallurgy

09

D

C09D 133/04 (2006.01) C09D 133/06 (2006.01) C09D 167/00 (2006.01) C08L 61/20 (2006.01)

Patent

CA 2264716

A film-forming composition is provided comprising: (i) pigment; (ii) an aminoplast cross-linking agent containing methylol and/or methylol ether groups; and (iii) a polymer or oligomer selected from the group consisting of (a) an acrylic polymer or oligomer containing a plurality of groups of structure (I), wherein R1 is hydrogen or methyl and R2 is a divalent group; (b) a polyester polymer or oligomer containing a plurality of terminal carbamate groups of structure (II); and (c) mixtures thereof. The film-forming composition is suitable for application over a substrate as a monocoat which exhibits a high level of acid etch resistance.

Cette composition de formation d'un film comprend: (i) un pigment, (ii) un agent de réticulation du type aminoplaste, contenant des groupes méthylol et/ou méthyloléther, et (iii) un polymère ou oligomère choisi dans le groupe constitué par (a) un polymère ou un oligomère acrylique contenant une pluralité de groupes possédant la structure (I), dans laquelle R¿1? représente hydrogène ou méthyle et R¿2? représente un groupe divalent, (b) un polymère ou un oligomère de polyester contenant une pluralité de groupes terminaux carbamate possédant la structure (II), et (c) des mélanges de ces polymères ou oligomères. Cette composition de formation d'un film est conçue pour être appliquée sur un substrat en tant que couche unique possédant un niveau élevé de résistance aux attaques acides.

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