Film-forming emulsion polish compositions containing...

Details Film-forming emulsion polish compositions containing... Film-forming emulsion polish compositions containing...

C - Chemistry, Metallurgy

09

G

C09G 1/16 (2006.01)

Patent

CA 2081009

Disclosed are emulsion polish compositions comprising a copolymeric siloxane selected from the group consisting of a po- ly(dimethyl)-co-poly(methylalkyl) siloxane polymer, a poly(dimethyl)-co-poly(methyl, oxygen-containing) siloxane polymer, and combinations thereof. The poly(dimethyl)-co-poly(methylalkyl) siloxane copolymer has formula (I) wherein "A" is an alkyl radi- cal having 10-20 carbon atoms, and wherein "w" is 70-91 mole percent and "x" is 9-30 mole percent. The poly(dimethyl)-co-po- ly(methyl, oxygen-containing) siloxane copolymer has formula (II) wherein "B" is (CH2)i(L)(CH2CH2O)nR, wherein "i" is an integer from 3 to 10 inclusive, wherein "L" is either -O- or -COO-, wherein "n" is either zero or an integer from 1 to 3 inclu- sive, wherein "R" is -H, -CH3, or -C2H5, and wherein "y" is 62-92 mole percent and "z" is 8-38 mole percent.

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