C - Chemistry – Metallurgy – 09 – D
Patent
C - Chemistry, Metallurgy
09
D
96/152, 400/5152
C09D 11/10 (2006.01) C08F 283/00 (2006.01) C08F 299/04 (2006.01) C09D 167/06 (2006.01) G03F 7/032 (2006.01)
Patent
CA 1067743
ABSTRACT OF THE DISCLOSURE: A film-forming halogenated photopolymerizable composition, which comprises: a) 20 to 70% by weight of at least one halogenated polymer, which (1) has a chain interrupted by at least one oxygen or nitrogen atom, (2) contains from 4 to 70 by weight halogen atoms attached to carbon atoms having the electronic configuration sp2, (called active halogen atoms), (3) has an average molecular weight between 700 and 10,000, (4) has a glass transition temperature (Tg) between 20°C and the thermal decomposition point of the polymer; b) 20 to 60% by weight of at least one monomer organic compound containing at least two acrylic acid or methacrylic acid radicals and containing from 0 to 65% by weight of active halogen atoms; c) 0 to about 40% by weight of at least one monomer organic compound containing an acrylic acid or methacrylic acid radical and containing from 0 to about 65% by weight active halogen atoms; d) about 1 to about 25% by weight of a photoinitiator system comprising 1) 0.5 to 100% by weight of at least one aromatic ketone, 2) 0 to 99.5% by weight of at least one tertiary amine, at least one carbon atom of which, in the alpha position with regard to the nitrogen atom, carries at least one hydrogen atom; 3) 0 to 90% by weight of an aromatic or non-aromatic alpha-dione, the sum of 1)+ 2)+ 3) representing 100% by weight of the photoinitiator system; and the total content of active halogen atoms representing about 3 to about 50% by weight of the total halogenated photopolymerizable composition and printing inks, paints and varnishes based on said halogenated photo- polymerizable composition, particularly suitable, inter alia, for the manufacture of printed circuits.
252140
Colpaert Marc
de Poortere Michel
Dufour Paul
Vrancken August
Na
Ucb S.a.
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