Film of titanium hydride

Details Film of titanium hydride Film of titanium hydride

C - Chemistry, Metallurgy

23

C

204/96.1

C23C 14/06 (2006.01) C23C 14/14 (2006.01) C23C 14/34 (2006.01) C23C 14/58 (2006.01) G21F 1/08 (2006.01) C23C 14/35 (2006.01)

Patent

CA 2036403

"FILM OF TITANIUM HYDRIDE" Abstract A low-temperature process is disclosed, according to which a metal film is deposited by sputtering, and is then turned into a metal hydride film by means of a cold hydrogen plasma. By means of this method, homogenoues and stable films of titanium hydride or of hydrides of other metals can be deposited on metal, glass and plastic materials.

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