C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/3.1
C11D 1/722 (2006.01) C11D 1/72 (2006.01) C11D 3/26 (2006.01) C11D 3/28 (2006.01) C11D 3/30 (2006.01) C11D 3/34 (2006.01) C11D 7/10 (2006.01)
Patent
CA 1322140
1710.008 FLOOR POLISH REMOVER ABSTRACT OF THE DISCLOSURE Floor polish remover compositions containing a low molecular weight nonionic surfactant, an alkaline builder, a hydrotrope and an amine, In one aspect, the floor polish remover composition of the present invention includes demineralized water such that the composition is in liquid form. The low molecular weight nonionic surfactants used in the present invention are the condensation products of low molecular weight alcohols having an average of from about 5 to about 11 carbon atoms with an alkylene oxide. A method of making the floor polish remover compositions of the present invention and their methods of use are also provided.
563943
Brumbaugh Ernest H.
Taylor Roy M. Jr.
Amway Corporation
Ridout & Maybee Llp
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