Flow control apparatus for a semiconductor manufacturing wet...

B - Operations – Transporting – 08 – B

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

B08B 15/00 (2006.01) H01L 21/00 (2006.01) H01L 21/02 (2006.01)

Patent

CA 2290922

Apparatus for controlling the volume of air that is supplied and exhausted from a electronic semiconductor manufacturing wet bench is disclosed. The volume of air that is exhausted from the wet bench is increased during predetermined portions of the manufacturing process and is reduced during noncritical times as a function of predetermined conditions that may be detected or otherwise determined during the manufacturing process.

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Flow control apparatus for a semiconductor manufacturing wet... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Flow control apparatus for a semiconductor manufacturing wet..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Flow control apparatus for a semiconductor manufacturing wet... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1411718

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.