F - Mech Eng,Light,Heat,Weapons – 16 – K
Patent
F - Mech Eng,Light,Heat,Weapons
16
K
137/38, 148/2.8
F16K 31/12 (2006.01) C23C 14/56 (2006.01) G05D 16/20 (2006.01) H01J 37/18 (2006.01) H01J 37/317 (2006.01) H01L 21/265 (2006.01)
Patent
CA 2010604
A fluid flow control for use with a process chamber. In the disclosed embodiment, the process chamber is for ion implantation of a workpiece and the fluid flow control is to assure the flow rates are maintained at values which are efficient in evacuating and pressurizing the chamber but are not high enough to dislodge particulate contaminants from the process chamber walls. In the disclosed design, the invention has utility both in instances in which wafers are directly inserted into the process chamber for ion implantation and in which the wafers are inserted into the chamber by use of a load-lock which avoids the requirement that the process chamber be cyclicly pressurized and depressurized.
Axcelis Technologies Inc.
Borden Ladner Gervais Llp
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