Fluorene compounds and methods for making

C - Chemistry – Metallurgy – 07 – F

Patent

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C07F 17/00 (2006.01) C07C 13/567 (2006.01) C07F 7/00 (2006.01) C07F 7/08 (2006.01) C07F 7/12 (2006.01) C07F 7/22 (2006.01) C07F 7/30 (2006.01)

Patent

CA 2119953

ABSTRACT OF THE DISCLOSURE A Process is disclosed comprising reacting an alkali metal salt of Z with MX4 to form a trihalo compound; reacting the trihalo compound with an alkali metal salt of Z' to form a dihalo compound; and reacting the dihalo compound with at least one alkali metal organic compound to form 2-MR2-Z', where Z is a substituted or unsubstituted fluorenyl radical, N is Ge, Si, or Sn, X is Cl, Br, F, or I, each R is a hydrocarbyl radical containing 1 to 20 carbon atoms, and Z' is an unsubstituted cyclopentadienyl, substituted cyclopentadienyl, unsubstituted indenyl, substituted indenyl, unsubstituted fluorenyl, or a substituted fluorenyl. Also new fluorene compounds are disclosed.

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