C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
C08G 65/40 (2006.01) C08G 75/23 (2006.01) C08L 71/00 (2006.01) C08L 81/06 (2006.01) H01L 23/29 (2006.01) H01L 23/498 (2006.01) H01L 23/532 (2006.01) H05K 1/00 (2006.01) H05K 1/03 (2006.01)
Patent
CA 2080832
Fluorinated poly(arylene ethers) having a repeat unit such as (A) are useful as dielectric materials in multilayer interconnects in integrated circuit chips and multichip modules and as protective materials for chips.
Mercer Frank W.
Sovish Richard C.
Alliedsignal Inc.
Gowling Lafleur Henderson Llp
Raychem Corporation
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