C - Chemistry – Metallurgy – 08 – F
Patent
C - Chemistry, Metallurgy
08
F
C08F 114/18 (2006.01) C08F 214/18 (2006.01) C08F 220/30 (2006.01) G03F 7/004 (2006.01) G03F 7/038 (2006.01) G03F 7/039 (2006.01)
Patent
CA 2493926
Fluorinated polymers useful in photoresist compositions and associated processes for microlithography are described. These polymers and photoresists have a fluoroalcohol functional group that simultaneously imparts high ultraviolet (UV) transparency and developability in basic media. The polymers also have a repeat unit derived from a C1-C25 alkyl hydroxymethylacrylate comonomer, e.g., tert-butyl hydroxymethylacrylate, or a C5-C50 polycyclic alkyl acrylate in which the polycyclic group contains a hydroxy group, e.g., hydroxyadamantyl acrylate. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 193 nm and 157 nm, which makes them highly useful for lithography at these short wavelengths.
L'invention concerne des polymères fluorés utiles dans des compositions de résines photosensibles ainsi que des procédés associés de microlithographie. Ces polymères et résines photosensibles comportent un groupe fonctionnel alcool fluoré conférant simultanément la transparence au rayonnement ultraviolet lointain et le développement en milieu basique. Les polymères comportent aussi une unité de répétition dérivée d'un comonomère de C¿1?-C¿25? alkylhydroxyméthacrylate, par exemple du tert-butylhydroxyméthacrylate, ou d'un C¿5?-C¿50? alkylacrylate polycyclique dans lequel le groupe polycyclique contient un groupe hydroxy, par exemple de l'hydroxyadamantylacrylate. Les matériaux de l'invention sont transparents aux UV lointains, particulièrement aux longueurs d'ondes courtes, par exemple 193 et 157 nm, ce qui les rend très utiles concernant la lithographie à ces longueurs d'ondes.
Endo Koutaro
Feiring Andrew Edward
Ogata Toshiyuki
Schadt Frank Leonard III
E.i. Du Pont de Nemours And Company
Torys Llp
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