C - Chemistry – Metallurgy – 07 – C
Patent
C - Chemistry, Metallurgy
07
C
C07C 49/813 (2006.01) C07C 45/00 (2006.01) C07C 45/71 (2006.01) C07C 49/84 (2006.01) C07C 225/22 (2006.01) C08G 8/02 (2006.01) C08G 12/00 (2006.01) C08G 61/12 (2006.01) C08G 73/06 (2006.01) C08G 75/00 (2006.01) H01G 4/14 (2006.01)
Patent
CA 2089092
The fluorinated quinoline polymers comprising repeating units of one or more quinoline groups wherein at least a portion of the repeating units include a group selected from hexafluoroisopropylidene (6F) and 1-aryl-2,2,2-trifluoroethylidene (3F) groups. The fluorinated quinoline polymers are a class of polymers that possess properties desired for many aerospace and elec- tronic applications, including as dielectric layers in multichip modules (I), capacitors (2), radomes (3), fibers (4), films (5), ther- mally stable laminating resins, interlevel planarizers, low observable coatings in the microelectronic packaging applications, com- posite matrix resins, protective coatings, potting compounds, adhesives and other high density interconnect devices.
Fetherstonhaugh & Co.
Hitachi Chemical Co. Ltd.
Maxdem Incorporated
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