Fluorine-containing n-sulphenylated indazoles, a process for...

C - Chemistry – Metallurgy – 07 – D

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

6/14, 167/10.2,

C07D 213/56 (2006.01) A01N 43/56 (2006.01) C07D 231/56 (2006.01) C07D 491/056 (2006.01)

Patent

CA 1275290

ABSTRACT OF THE DISCLOSURE Novel fluorine-containing N-sulfenylated indazoles of the formula I (I) wherein X and Y represent halogen, n denotes 0, 1, 2 or 3 and R1, R2 and R3 are identical or different and represent halogen, nitro or alkyl, alkoxy or alkythio each of which may be substituted by fluorine, chlorine or bromine or R1, R2 and R3 form together a methylenedioxy or ethylenedioxy group which is optionally monosubstituted or polysubstituted by fluorine or chlorine, with the proviso that if R1, R2, or R3 represent halogen or nitro at least one of the other substituents is also present and at least one of the radicals R1 to R3 represents fluorine or contains a fluorine-substituted carbon atom.

502215

LandOfFree

Say what you really think

Search LandOfFree.com for Canadian inventors and patents. Rate them and share your experience with other people.

Rating

Fluorine-containing n-sulphenylated indazoles, a process for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Fluorine-containing n-sulphenylated indazoles, a process for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Fluorine-containing n-sulphenylated indazoles, a process for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFCA-PAI-O-1226675

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.