Fluorine production method

Details Fluorine production method Fluorine production method

C - Chemistry, Metallurgy

01

B

C01B 7/20 (2006.01)

Patent

CA 2511233

The invention relates to fluorine production, in particular to methods for producing fluorine from solid-phase metal fluorides and the complex salts thereof by thermal decomposition. Gaseous fluorine is used for many purposes such as the production of fluorine compounds by direct fluorination, for metal welding, for producing protective films on metals during machining metals and alloys, etc and in the form of etching reagent for microelectronics. Manganese salts with a high fluorine content, i.e. manganese tetrafluoride MnF4 and other salts, for example K3NiF7, K2NiF7, K2CuF6 and analogous compounds are used as initial compounds. The invention ensures a fluorine yield which is equal or higher than 99.0 %. The inventive method is safe and easily used for production.

L'invention appartient au domaine de la production de fluor et plus particulièrement à celui des procédés de production de fluor à partir de fluorures de métaux en phase solide ou de leurs sels composés au moyen de la dissolution thermique. Le fluor gazeux est utilisé dans plusieurs domaines, par exemple, dans la production de compositions fluorées par fluoration directe, le soudage de métaux, la formation de films de protection sur les métaux ou le traitement de surfaces de métaux et d'alliages et en tant que réactif d'attaque en micro-électronique. On utilise en tant que compositions de base des sels de manganèse à haute teneur en fluorure tels que le tétrafluorure de manganèse MnF4 et d'autres sels tels que K3NiF7, K2NiF6, K2CuF6 et des compositions analogues. Ce procédé permet d'obtenir un rendement de fluor égal ou supérieur à 99,0 %. Il se distingue par sa sécurité et sa simplicité.

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