C - Chemistry – Metallurgy – 07 – D
Patent
C - Chemistry, Metallurgy
07
D
260/593, 260/290
C07D 295/22 (2006.01) B01F 17/00 (2006.01) C07D 217/12 (2006.01) C08G 65/00 (2006.01) C08G 65/26 (2006.01) C08G 65/333 (2006.01)
Patent
CA 1187495
ABSTRACT OF THE DISCLOSURE The invention covers chemical compositions, compounds, and admix- tures of compounds described by the following formula: Formula II Image wherein x is an integer of from 2 - 12 or an integer or fractional integer representing an average value of from 2 - 12; w is an integer of from 1 - 20 or an integer or fractional integer representing an average value of from 1 - 20; y and z are both individually integers from 0 - 20 or are integers or fractional integers representing average values of from 0 - 20, provided that the sum, y+z, is from 1 - 20; R represents a hydrogen, methyl, ethyl, or propyl radical, or mixtures thereof; Q is a cationic nitrogen containing radical from the group consisting of: (i) an aromatic/heterocyclic amino radical formed from the following compounds: 2-H-pyrrole, pyrrole, imidazole, pyrazole, pyridine, pyrazine, pyrimidine, pyridazine, indolizine, isoindole, 3H-indole, indole, 1H-indazole, purine, 4H-quinolizine, quinoline, isoquino- line, phthalazine, naphthyridine, quinoxaline, quinazoline, 4aH-carbazole, carbazole, .beta.-carboline, phenanthridine, acridine, phenanthroline, phenazine, imidazolidine, phenoxazine, cinnoline, pyrrolidine, pyrroline, imidazoline, piperidine, piperazine, indoline, isoindoline, quinuclidine, morpholinc, azocine, azepine, 2H-azepine, 1,3,5-triazine, thiazole, pteridine, dihydro- quinoline, hexa methylene imine, indazole; and (ii) an amine radical rep- resented by the formula: Image wherein R1, R2, and R3 are from the group consisting of hydrocarbon radicals containing from 1 - 30 carbon atoms and hydrogen radicals, provided that at ABSTRACT: least one of R1, R2, and R3 is from the group of alkyl, aryl, alkaryl, aliph- atic, or cycloaliphatic hydrocarbon radicals containing from 1 - 30 carbon atoms and that when any one of the R1, R2 and R3 radicals contains more than carbon atoms, the other two radicals are each chosen from the group con- sisting of hydrogen, methyl, and ethyl radicals; and A is a halogen chosen from the group consisting of chlorine, bromine, and iodine. This halogen may be present as either an halo radical covalently bonded to carbon or as an anion, These compounds find a number of uses deriving from their surfactant properties.
422991
Briscoe James E.
Penny Glenn S.
Seale Virgil L.
Stanford James R.
Nalco Chemical Company
Smart & Biggar
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