Fluorometric method for monitoring a clean-in-place system

Details Fluorometric method for monitoring a clean-in-place system Fluorometric method for monitoring a clean-in-place system

G - Physics

01

N

G01N 21/76 (2006.01) G01N 27/64 (2006.01)

Patent

CA 2611025

The invention pertains to a method for fiuorometrically monitoring a Clean-In- Place ("CIP") system and for fiuorometrically monitoring the dosage of chemical added to the CIP system. Monitoring of the said CIP system can be based upon fluormetrically monitoring the fluorescent tracer, chemical or both, which are added to the CIP system.

L'invention concerne une méthode de surveillance fluorométrique d'un système de nettoyage en place ("NEP") et de surveillance fluorométrique du dosage d'agent chimique ajouté au système NEP. La surveillance dudit système NEP peut être basée sur la surveillance fluorométrique du traceur fluorescent, de l'agent chimique ou des deux, qui sont ajoutés au système NEP.

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