H - Electricity – 01 – L
Patent
H - Electricity
01
L
H01L 21/312 (2006.01) B05D 5/08 (2006.01) B05D 7/14 (2006.01) B05D 7/24 (2006.01)
Patent
CA 2487486
A process is disclosed for forming a fluoropolymer layer on a thin film device, comprising contacting said thin film device with a gas phase fluoromonomer, and initiating polymerization of said fluoromonomer with a free radical polymerization initiator whereby said fluoromonomer polymerizes to form said fluoropolymer layer on said thin film device.
L'invention concerne un procédé de formation d'une couche de fluoropolymères sur un composant à couches minces. Ce procédé comprend les étapes consistant à : mettre ce composant à couches minces en contact avec un fluoromonomère en phase gazeuse ; et à induire la polymérisation de ce fluoromonomère au moyen d'un initiateur de polymérisation radicalaire, la polymérisation dudit fluoromonomère entraînant la formation d'une couche de fluoropolymères sur le composant à couches minces.
Brichko Yakov
Feiring Andrew E.
Lopata Eugene
Mocella Michael
Rose Peter
E.i. Du Pont de Nemours And Company
Torys Llp
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