C - Chemistry – Metallurgy – 08 – G
Patent
C - Chemistry, Metallurgy
08
G
400/2006
C08G 77/44 (2006.01)
Patent
CA 1082396
ABSTRACT OF THE DISCLOSURE There is provided by the present invention a solvent resistant block copolymer having desirable process ability comprising a copolymer of the formula, Image where R is an alkyl radical of 1 to 3 carbon atoms, R1 is a perfluoroalkyl radical of 1 to 8 carbon atoms, Vi is vinyl, B is selected from the class consisting of lithium and hydrogen, x varies from 20 to 400 and y varies from 700 to 6000 and z varies from 0 to 100. There is also provided by the present invention an advantageous process for producing the above block copolymer.
263794
Company General Electric
Eckersley Raymond A.
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