C - Chemistry – Metallurgy – 11 – D
Patent
C - Chemistry, Metallurgy
11
D
134/6
C11D 3/37 (2006.01) C11D 3/48 (2006.01)
Patent
CA 1156899
ABSTRACT OF THE DISCLOSURE: A skin cleansing composition comprising an anti- septic agent, a polyoxyethylene-polyoxybutylene block co- polymer wherein the polyoxybutylene portion of the compound has a molecular weight of from 500 to 2000 and the poly- oxyethylene portions contribute from about 60 to 90 percent by weight of the compound and water.
389256
Basf Wyandotte Corporation
Robic Robic & Associes/associates
LandOfFree
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